• Atmospheric pressure operation (unique in the world)
• Estimate work function, ionization potential, density of states (DOS)
• Measure thickness of thin films on the material surface (less than 20 nano-meters)
• Measure the sample of powder and liquid
• Low photo – excitation energy (5.0 – 6.20eV)
• Measurement for just 5 minutes
• Easy sample introduction and removal
• Full computer control

Additional Benefits:

• Easy to measure the Density of States (DOS) around the highest occupied orbital, work function and ionization potential.
• Information for tiny surface on nanometer order and tiny thin film thickness (0-20nm) can be measured
• Powder and liquid samples which are unable to bring into the vacuum also can be measured
• Measurement taken in just 5 minutes (when measured in 5.0 – 7.0eV energy search range with step 0.1eV)

Applications:

• Measurement of ionization potential on organic materials used in solar cell, fuel cell organic EL and organic TFT
• Measurement of ionization potential on photocatalyst
• Evaluation of MgO film quality on plasma display panel (PDP)
• Measurement of electronic states for carbon nanotube and fullerene
• Measurement of electronic states on carbon thin film and diamond thin film
• Measurement of electronic states for cosmetics, medicine and chemicals
• Measurement of ionization potential on sensitive materials
• Measurement of contamination and oxidized film thickness for electrode, lead frame, contacts, steel plate, silicon wafer and compound semiconductor wafer
• Measurement of work function on metallic materials for various electrodes

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